12N high quality NTD monocrystalline silicon ingots

1:high purity :12N(99.9999999999%) 2:float zone technology.N<111> 3:diameter:2"-4" 4:single crystal silicon 5:30~200 ohm cm

Our advantages on owner's power supply insure the cost lower, so Xinhua is more professional .welcome to contact us for products.

Application areas:Float-zone silicon's  traditional usage is in power electronics, which is made for power electronics component e.g. SCR MOSFET IGBT and so on.and nowadays fusioning-zone technology is also been used in green energy resource area.photoelectricity conversion efficiency will reach 20% ,while the efficiency will  be 12% more by pulling of single crystal silicon.

The FZ  form principles:

The growth proess starts by inserting a polycrystalline ingot into the upper chamber/pulling arrangment.Thereafter the ingot is pre-heated by means of a graphite heater.After pre-heating,the graphite heater is swung away and the cone-shaped ingot is lowered into the active zone of the high frequency coil.which is  able to melt the silicon ingot to the seed crystal.The one-pass monocrystalline growth process can  begin now.

12N high quality NTD monocrystalline silicon ingots